83% Surface finish: polished on both sides Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater"> 83% Surface finish: polished on both sides Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater"> 83% Surface finish: polished on both sides Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater"> ITO Coated Glass Substrate 1" x 1" x 1.1 mm, R:8-10 ohm/sq, Nominal ITO film thickness: 180 nm - ITO252511R10HFT180nm GaSb EPD: < 5000cm^2 – wnoz-abocard.de

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ITO Coated Glass Substrate 1" x 1" x 1.1 mm, R:8-10 ohm/sq, Nominal ITO film thickness: 180 nm - ITO252511R10HFT180nm GaSb EPD: < 5000cm^2

$17.19

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Description

EPD:                                        < 5000cm^2

Item Description Testing Method D10 (

Edge Exclusion Area 1mm

Please clean the grinding ring before each use

Thickness:     0

ITO Coated Glass Substrate 1" x 1" x 1.1 mm, R:8-10 ohm/sq, Nominal ITO film thickness: 180 nm - ITO252511R10HFT180nm GaSb EPD: < 5000cm^2Indium Tin Oxide (ITO) coated Glass Plates Dimension: 1" x 1" x 1. 1 mm ( + 0. 2 mm) Sheet Resistance: R: 8 10 ohm sq Nominal ITO film thickness: 180 nm Transmittance of ITO glass: > 83% Surface finish: polished on both sides Related Products Thin Films A Z Crystal wafer A Z Plasma Cleaner Wafer Containers Dicing saw Film Coater

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