Thick Aluminum Nitride Substrate for RTP Furnace's Sample Holder - EQ-AIN-Holder Orientation 10-14 Polished surface: substrate surface is

Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 8 A

Chemical Formula Na2Mn[Fe(CN)6] Powder Color Light Gery/White

MTI's high vacuum pump with KF40 port to 80mm OD tube furnace with KF40 flange

EPI polished  on one side or two sides to Ra < 10 Å

005 Cu (wt%) <0

Thick Aluminum Nitride Substrate for RTP Furnace's Sample Holder - EQ-AIN-Holder Orientation 10-14 Polished surface: substrate surface isSuch unpolished Aluminum Nitride can be placed in the center of holder for holding test samples up to 3" or 5" diam. The excellent temperature uniformity can be achieved in this 3" or 5" diam. area due to the benefit from its high thermal conductivity. Aluminum Nitride Ceramic Substrates Properties Item No. AIN Holder Purity (wt%) 99% (AN5116) Density (g cm3) >3. 26 Thermal Conductivity (W m. K) >170 Thermal Expansion (x10 6 oC) <4. 2 Dielectric