Al2O3- Sapphire Wafer, C-plane (0001), 0.5"x0.5"x0.5mm, 2Sp - ALC121205S2 Processing Tubes All pressing dies are made

All pressing dies are made by high-stretched carbon steel to achieve high hardness to meet the essential requirements of making ceramic or metal samples

TIR<= 10um

or corrosive

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Double-wall stainless steel construction provides durability and safely stores corrosive the chemicals and less leaking rate

Al2O3- Sapphire Wafer, C-plane (0001), 0.5"x0.5"x0.5mm, 2Sp - ALC121205S2 Processing Tubes All pressing dies are madeFeatures: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties. Wafer size: 0. 5" x 0. 5" x 0. 5 mm thick Orientation tolerance: + 0. 5 Deg. C plane orientation Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 8 A 2 sides polished Package: Each wafer is packed in 1000 class clean room