MgO (110) Substrate 5x5x0.5 mm , 1SP - MGe050505S1 CdS Coating method: Magnetron sputtering

Coating method: Magnetron sputtering

EQ-Se-KTQ-150D is a double-blade wet film applicator with adjustable thickness

Pressure Conversion Table (Notice the Load is not strictly linear to the Air Pressure):

Ball mill and sieve the powder and apply only the 32~75 mircrons powder to the pressing die to avoid the damages

Specific Capacity: 190 mAh/g [0

MgO (110) Substrate 5x5x0.5 mm , 1SP - MGe050505S1 CdS Coating method: Magnetron sputteringSpecifications of MgO substrate Size: 5x5x 0. 5mm + 0. 05 mm Orientation: (110) + 0. 5 Deg Polish: One or two side EPI polished by CMP technology with minimum sub surface damage. Surface finish (RMS or Ra): < 10A Packing: The substrate is packed with 100 grade clean plastic bag under 1000 class clean room Precautions: MgO is sensitive to moisture, and must be stored in vacuum box. Warning: MgO crystal was grown by arc melting method and nature