Aluminum Film on Silicon Wafer, 3 microns / 4" -- Al-Si-100-3um, Si(100) N-type, R:1-20 ohm.cm - FmAlonSiPa101D0525C1FT3umR1 Spin Coaters Made of SS304 stainless steel

Made of SS304 stainless steel

(Please click the link to order a customized Traverse Pusher

Polished surface:   One sideEPI polished via a special CMP procedure

3" (60mm)  (+/-1°C)

It can seal air-sensitive samples inside the glovebox and transport the sample to the outside glovebox through an antechamber or seals the sample from the outside glovebox by vacuum pump to put it into the glovebox through the antechamber air chamber

Aluminum Film on Silicon Wafer, 3 microns / 4" -- Al-Si-100-3um, Si(100) N-type, R:1-20 ohm.cm - FmAlonSiPa101D0525C1FT3umR1 Spin Coaters Made of SS304 stainless steelAluminum Metallic Film Film coated by E beam evaporation under vacuum below 10 6 torr evaporation rate: 0. 2 nanometer per second Aluminum Thickness: 3 microns Film Resistivity: 2. 65 micro ohm cm Film Crystallinity: Weak (111) oriented polycrystals Roughness, RMS: 4. 87 nm and < 10 nm Silicon Wafer Specifications: Conductive type: Si n type Resistivity: 1 10 ohm cm Size: 4" diameter + 0. 5 mm x 0. 525 + 0. 025 mm th Orientation: (100) + 0. 5o Polish: