Al2O3 - Sapphire Wafer 5x5x0.5 mm, A plane (11-20), 1 SP - ALA050505S1 Separator Heating Rate: 5ºC/minute recommended

Heating Rate:                  5ºC/minute recommended

Viton O-ring size: Ø75 mm OD נØ70 mm ID × 2

This is fixed thickness precision film applicator with four paths of 5

Two steel support plates

Weight     8

Al2O3 - Sapphire Wafer 5x5x0.5 mm, A plane (11-20), 1 SP - ALA050505S1 Separator Heating Rate: 5ºC/minute recommendedFeatures: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties Wafer size: 5 mm x 5 mm x 0. 5 mm thick Orientation tolerance: + 0. 5 Deg. A plane orientation Polished surface: One side EPI polished via a special CMP procedure with Ra < 5 A Package: Each wafer is packed in 1000 class clean room with 100 grade plastic bag with