M02100 - SEMI M21 - カーテシアン（デカルト）アレイにおける方形エレメントへの割当アドレスのガイド Revision:SEMI M21-1110 - Superseded SEMI S10-0115 (technical revision)

SEMI S10-0115 (technical revision)

This Guide provides guidance for the technical foundation of the SEMI Computer Integrated Manufacturing (CIM) Framework Standards

and behavior are specified in these Documents to promote further device interoperability as features evolve and are adopted by more manufacturers

本試験方法の目的は，MFCに関わる取付姿勢の影響を定量化する標準方法を提供することである。

This Guide covers angle resolved light scatter (ARLS) measurements performed on monocrystalline (also known as single crystal) and multicrystalline (also known in some regions as polycrystalline) semiconductor wafer surfaces

M02100 - SEMI M21 - カーテシアン（デカルト）アレイにおける方形エレメントへの割当アドレスのガイド Revision:SEMI M21-1110 - Superseded SEMI S10-0115 (technical revision)global Silicon Wafer Committee2010827 global Audits & Reviews Subcommittee201010www. semi. org199220043 Referenced SEMI Standards SEMI M1 Specifications for Polished Single Crystal Silicon Wafers SEMI M17 Guide for a Universal Wafer Grid SEMI M20 Practice for Establishing a Wafer Coordinate System SEMI M59 Terminology of Silicon Technology