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M07000 - SEMI M70 - パーシャルサイト平坦度を使ってウェーハのエッジ近傍形状を決定するための作業方法 StdPbc-0718 SEMI MF84-0312 (technical revision)
M07000 - SEMI M70 - パーシャルサイト平坦度を使ってウェーハのエッジ近傍形状を決定するための作業方法 StdPbc-0718 SEMI MF84-0312 (technical revision)
$115.50
Description
SEMI MF84-0312 (technical revision)
By doing a separate analysis
and exceptions provided by their equipment
• Recipe linkage
circular arcs
M07000 - SEMI M70 - パーシャルサイト平坦度を使ってウェーハのエッジ近傍形状を決定するための作業方法 StdPbc-0718 SEMI MF84-0312 (technical revision)global Silicon Wafer Committee200994global Audits and Reviews Subcommittee200910www. semi. org200911CD ROM20073200811 PSFQR PSFQD ZDDESFQRROA Referenced SEMI Standards SEMI M1 Specifications for Polished Single Crystal Silicon Wafers SEMI M20 Practice for Establishing a Wafer Coordinate System SEMI M49 Guide for Specifying Geometry Measurement Systems for Silicon Wafers for the 130 nm to 22 nm Technology Generation
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