P03200 - SEMI P32 - Test Method for Determination of Trace Metals in Photoresist StdVol-Microlithography Initially available in January 2000

Initially available in January 2000

主要なモジュールおよび装置全体の両方について，モジュラ式に装置の基本的な状態をトラッキングすること。

本文書の範囲は半導体産業で使用されるトランス1，2ジクロロエチレンの提案された不純物限度の一覧作成である。

is used as a bubbler in process equipment or a container for liquid chemical distribution system in semiconductor/flat panel display manufacturing

1  EtherNet/IP is a communication system suitable for use in industrial environments

P03200 - SEMI P32 - Test Method for Determination of Trace Metals in Photoresist StdVol-Microlithography Initially available in January 2000This test method was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on July 23, 2004. Initially available at www. semi. org August 2004; to be published November 2004. Originally published September 1998. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to